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Sputtering targets

titanium round target : DIA 100X45mm, DIA 100X40mm, DIA 80X40mm

Place of Origin:Shaanxi, China (Mainland)
Brand Name:YUNCH
normal size thickness≥10~45mm
normal size Diameter≤100mm
Application:industry pvd processing/coting/semiconductor
low-E glass, PV cells, electronic device and decoration
Shape: round,plate,tube
Material:Titanium,Zr,Ni,Al,TiAl,Nb
Dimensions:as customized
Chemical Composition: Metal
powder or not: not power
Keyword:sputtering target for Vaccum Coating
Technique:forge,grind,bright
color: Metallic
Purity:2N8-5N
Certification:ISO,EN10204 3.1,EN10204 3.2
Type: Sputtering target, Round target,
Part tolerance:±0.05
Ra:1.6-6.3
Inspection:Ultrasonic examination,water pressure test.
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Product Description

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Product nameastm b348 Gr2 pure titanium vacuum sputtering target
GradeGr2
Originbaoji city Shaanxi Province china
shapeRound target / plate target / tube target
Titanium content≥99.8 (%)
Impurity content<0.02 (%)
Density4.51 or 4.50
GradeGr2
Round target

Dia:20-300mm

Thickness:10-80mm

Plate target

Length:315.5-601.6mm

Width:31.5-304.8mm

Thickness:3-30mm

Tube target

Dia:30-200mm

Thickness:5-20mm

Length:500-2000mm

Application

Semiconductor separation,film coating materials,Storage Electrode coating,Sputtering coating,surface coating,Glass coating industry.

 

 

Different Material Sputting Target

 

High pure metal sputtering target

Aluminum

Al

pellet,round,planar,rotatable target

3N~6N

Chronium

Cr

pellet,round,planar,rotatable target

2N~3N5

Zirconium

Zr

pellet,round,planar,rotatable target

2N2-3N5

Titanium

Ti

pellet,round,planar,rotatable target

4N~5N

Molybdenum

Mo

pellet,round,planar,rotatable target

3N5

Nickel

Ni

pellet,round,planar,rotatable target

3N5

Niobium

Nb

pellet,round,planar,rotatable target

3N5

Tatalum

Ta

pellet,round,planar,rotatable target

3N5

Tungsten

W

pellet,round,planar,rotatable target

3N5

Copper

Cu

pellet,round,planar,rotatable target

3N~4N

Hafnium

Hf

pellet,round,planar,rotatable target

3N5

Iron

Fe

pellet,round,planar,rotatable target

4N~5N

Platinum

Pt

pellet,round,planar,rotatable target

4N~5N

Indium

In

pellet,round,planar,rotatable target

4N~5N

Germanium

Ge

pellet,round,planar,rotatable target

4N~6N

Silicon

Si

pellet,round,planar,rotatable target

4N~6N

Silver

Ag

pellet,round,planar,rotatable target

4N~5N

Gold

Au

pellet,round,planar,rotatable target

4N~6N

Tin

Sn

pellet,round,planar,rotatable target

4N~6N

Manganese

Mn

pellet,round,planar,rotatable target

4N5

Cobalt

Co

pellet,round,planar,rotatable target

4N~5N

Zinc

Zn

pellet,round,planar,rotatable target

3N

Vanadium

V

pellet,round,planar,rotatable target

2N5~3N

 

1. Specification: wafer, circular truncated cone, rectangle, sheet

 

2. Size:  rectangle / sheet / step-like shape

 

             pipe/ring/rotating target 

 

3. Purity: >=99.9% 


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