Magnetron sputtering coating is a new type of physical vapor deposition method, compared with the earlier evaporation coating method, its advantages are obvious. As a mature technology, magnetron sputtering has been used in many fields.
Magnetron sputtering target:
The metal alloy sputtering target, sputtering target, sputtering ceramic target, boride ceramic sputtering carbide ceramic sputtering fluoride ceramic sputtering nitride ceramic oxide ceramic target sputtering, selenide ceramic sputtering ceramic silicide sputtering sulfide ceramic sputtering telluride ceramic sputtering other ceramic target, chromium doped silicon oxide ceramic target (Cr-SiO), indium phosphide (InP), the target of arsenic lead target (PbAs), InAs target (InAs).
High purity and high density construction target is:
Sputtering target (purity: 99.9%-99.999%)
1 metal target:
Target, Ni, nickel titanium target, Ti, Zn, Cr, Zn, Mg, Cr, target Mg, target Nb, target, target niobium tin, Sn, aluminum target and Al target, In, iron and indium target, Fe, target, ZrAl, Zr Al Ti and Al targets, TiAl, zirconium target Zr, AlSi, silicon aluminum silicon target, target Si, target Cu, target T copper, tantalum target, Ge, a, Ge, Ag, cobalt silver target target, Co, Au, Gd, gold target, target Gd, target La, target yttrium, lanthanum, cerium, target, Ce, Y tungsten target, W, stainless steel, nickel chromium target target, target and Hf, NiCr, hafnium molybdenum target and Mo target, FeNi, iron nickel, tungsten target, W etc..
2 ceramic target
Magnesium Oxide ITO target, target, target, target, iron oxide, silicon nitride, titanium nitride, silicon carbide target target target, target, Zinc Oxide chrome, zinc sulfide, silica target target target, a silicon oxide cerium oxide target, two zirconia target, five oxidation two niobium target and titanium dioxide target, two zirconia target, two the target of hafnium oxide, zirconium boride titanium diboride targets, two target, target two aluminum oxide tungsten trioxide, three target five two five two tantalum oxide, oxide, magnesium fluoride, niobium target target target target, ZnSe yttrium fluoride, aluminum nitride target, silicon nitride boron nitride target, target, target of titanium nitride, silicon carbide target, lithium niobate target, target, target titanate praseodymium barium titanate, lanthanum titanate target, nickel oxide target, sputtering target etc..