PACVD is an abbreviation for plasma assisted chemical vapor deposition.
What is PACVD technology?
PACVD is an abbreviation for plasma assisted chemical vapor deposition. Sometimes writing PECVD, E stands for enhanced meaning. In the PVD process, the coating material is obtained from the solid form of evaporation; while in the PACVD process, the coating is obtained from the gas form. Gas, such as HMDSO (six methyl two silyl ether) in plasma, cracking occurred about 200 degrees C. Non reacting gases, such as argon, can be deposited onto the surface of the workpiece and form a thin coating. Diamond like carbon (DLC) coating is a very good example of PACVD technology, which is usually used in the field of tribology and automotive industry.